Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy

Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy

Author(s):

Mori, Y. ( Osaka Univ. (Japan) )

Yamauchi, K. ( Osaka Univ. (Japan) )

Yamamura, K. ( Osaka Univ. (Japan) )

Mimura, H. ( Osaka Univ. (Japan) )

Sano, Y. ( Osaka Univ. (Japan) )

Saito, A. ( Osaka Univ. (Japan) )

Endo, K. ( Osaka Univ. (Japan) )

Souvorov, A. ( SPring-8/Japan Synchrotron Radiation Research Institute (Japan) )

Yabashi, M. ( SPring-8/Japan Synchrotron Radiation Research Institute (Japan) )

Tamasaku, K. ( Spring-8/RIKEN (Japan) )

Ishikawa, T. ( Spring-8/RIKEN (Japan) )

Shimura, M. ( Research Institute International Medical Ctr. (Japan) )

Ishizaka, Y. ( Research Institute International Medical Ctr. (Japan) )

8 more

Publication title:

Advances in mirror technology for X-ray, EUV lithography, laser, and other applications : 7-8 August 2003, San Diego, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5193

Pub. Year:

2004

Page(from):

11

Page(to):

17

Pages:

7

Pub. info.:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819450661 [0819450669]

Language:

English

Call no.:

P63600/5193

Type:

Conference Proceedings

Details

TDL ID:	ZA00013561
Series ID:	PA00000029
Conf. info. (Name):	Optics & Photonics : Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications
Conf. info. (Number):	2003
Conf. info. (Venue):	San Diego, CA, USA
Conf. info. (Date):	2003.08.07-2003.08.08

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