EUV emission of solid targets irradiated by femto- and picosecond laser pulses

EUV emission of solid targets irradiated by femto- and picosecond laser pulses

Author(s):

Soumagne, G. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Abe, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Ikeda, K. ( Graduate Univ. for Advanced Studies (Japan) )

Komori, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Someya, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Suganuma, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Nakajima, K. ( Graduate Univ. for Advanced Studies (Japan) and High Energy Accelerator Research Organization (Japan) )

Endo, A. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

3 more

Publication title:

Fourth International Symposium on Laser Precision Microfabrication : 21-24 June, 2003, Munich, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5063

Pub. Year:

2003

Page(from):

274

Page(to):

277

Pages:

4

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819448699 [0819448699]

Language:

English

Call no.:

P63600/5063

Type:

Conference Proceedings

Details

TDL ID:	ZA00013528
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Laser Precision Microfabrication
Conf. info. (Number):	2003 : 4th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2003.06.21-2003.03.24

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