Extreme ultraviolet sources and measurement tools for EUV-lithography and system development

Extreme ultraviolet sources and measurement tools for EUV-lithography and system development

Author(s):

Gaebel, K.M. ( XTREME Technologies GmbH (Germany) )

Kleinschmidt, J. ( XTREME Technologies GmbH (Germany) )

Schriever, G. ( XTREME Technologies GmbH (Germany) )

Stamm, U. ( XTREME Technologies GmbH (Germany) )

Lebert, R. ( AIXUV GmbH (Germany) )

Schuermann, M.C. ( Jenoptik Mikrotechnik GmbH (Germany) )

1 more

Publication title:

Fourth International Symposium on Laser Precision Microfabrication : 21-24 June, 2003, Munich, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5063

Pub. Year:

2003

Page(from):

256

Page(to):

264

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819448699 [0819448699]

Language:

English

Call no.:

P63600/5063

Type:

Conference Proceedings

Details

TDL ID:	ZA00013528
Series ID:	PA00000029
Conf. info. (Name):	International Symposium on Laser Precision Microfabrication
Conf. info. (Number):	2003 : 4th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2003.06.21-2003.03.24

Similar Items:

1 Conference Proceedings Progress on EUV-source development, tool integration, and applications Lebert, R., Jagle, B., Wies, C., Stamm, U., Kleinschmidt, J., Gaebel, K., Schriever, G., Pankert, J., Bergmann, K., … SPIE - The International Society of Optical Engineering	7 Conference Proceedings High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma Stamm, U., Ahmad, I., Borisov, V.M., Flohrer, F., Gaebel, K., Goetze, S., Ivanov, A.S., Khristoforov, O,B., Kloepfel, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings High-power sources for EUV lithography: state of the art Stamm, U., Kleinschmidt, J., Gaebel, K.M., Birner, H., Ahmad, I., Bolshukhin, D., Brudermann, J., Chinh, T.D., Flohrer, … SPIE - The International Society of Optical Engineering	8 Conference Proceedings High-power-gas-discharge- and laser-plasma-based EUV sources Flohrer, F., Gaebel, K., Kloepfel, D., Koehler, P., Ahmad, I., Goetze, S., Kleinschmidt, J., Korobotchko,V., Ringling, … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Compact electron-based extreme-ultraviolet source at 13.5 nm Egbert, A., Mader, B., Tkachenko, B., Ostendorf, A., Chichkov, B.N., Missalla, T., Schuermann, M.C., Gaebel, K., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Metrology tools for EUV-source characterization and optimization Missalla, T., Schuermann, M.C., Lebert, R., Wies, C., Juschkin, L., Klein, R.M., Scholze, F., Ulm, G., Egbert, A., … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Status report on EUV source development and EUV source applications in EUVL V. Bakshi, R. Lebert, B. Jaegle, C. Wies, U. Stamm, J. Kleinschmidt, G. Schriever, C. Ziener, M. Corthout, J. Pankert, … SPIE - The International Society of Optical Engineering	10 Conference Proceedings EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology Stamm, U., Kleinschmidt, J., Gabel, K., Hergenhan, G., Ziener, C., Ahmad, I., Bolshukhin, D., Korobotchko, V., Keller, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings EUV source power and lifetime: the most critical issues for EUV lithography Stamm, U., Kleinschmidt, J., Gaebel, K., Birner, H., Ahmad, I., Bolshukhin, D., Brudermann, J., Chinh, T.D., Flohrer, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Dervelopment of high-power EUV sources for lithography Borisov, V.M., Ahmad, I., Goetze, S., Ivanov, A.S., Khristoforov, O.B., Kleinschmidt, J., Korobotchko, V., Ringling, J., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings EUV source development for high-volume chip manufacturing tools U. Stamm, M. Yoshioka, J. Kleinschmidt, C. Ziener, G. Schriever, M. C. Schurmann, G. Hergenhan, V. M. Borisov SPIE - The International Society of Optical Engineering	12 Conference Proceedings Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools [6151-24] Stamm, U., Kleinschmidt, J., Bolshukhin, D., Brudermann, J., Hergenhan, G., Korobotchko, V., Nikolaus, B., Schrmann M. … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12