Enhancement of diffusion barrier properties of Ta by plasma immersion ion implantation

Enhancement of diffusion barrier properties of Ta by plasma immersion ion implantation

Author(s):

Kumar, M. ( Kurukshetra Univ. (India) )

Kumar, R. ( Semiconductor Complex Ltd. (India) )

Kumar, D. ( Kurukshetra Univ. (India) )

Raole, P.M. ( Institute for Plasma Research (India) )

George, P.J. ( Kurukshetra Univ. (India) )

Gupta, S.B. ( Institute for Plasma Research (India) )

Paul, D.K. ( Central Scientific Instruments Organisation (India) )

2 more

Publication title:

Smart Materials, Structures, and Systems

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5062

Pub. Year:

2003

Page(from):

160

Page(to):

165

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819448682 [0819448680]

Language:

English

Call no.:

P63600/5062.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013526
Series ID:	PA00000029
Conf. info. (Name):	Smart materials, structures, and systems
Conf. info. (Number):	2002
Conf. info. (Venue):	Bangalore, India
Conf. info. (Date):	2002.12.12-2002.12.14

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