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Rigorous simulation of lithographic exposure of photoresist over a nonplanar wafer

Author(s):
  • Erdmann, A. ( Fraunhofer-Institute fur Integrierte Sys/Bauelemen (Germany) )
  • Kalus, C.K. ( SIGMA-C GmbH Software (Germany) )
Publication title:
19th Congress of the International Commission for Optics: Optics for the Quality of Life
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4829
Pub. Year:
2003
Page(from):
775
Page(to):
776
Pages:
2
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819445964 [0819445967]
Language:
English
Call no.:
P63600/4829.2
Type:
Conference Proceedings

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