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Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography

Author(s):
Fedynyshyn, T.H.
Mowers, W.A.
Kunz, R.R.
Sinta, R.F.
Sworin, M.
Cabral, A.
Curtin, J.
2 more
Publication title:
Polymers for microelectronics and nanoelectronics
Title of ser.:
ACS symposium series
Ser. no.:
874
Pub. Year:
2004
Page(from):
54
Page(to):
71
Pages:
18
Pub. info.:
Washington, D.C.: American Chemical Society
ISSN:
00976156
ISBN:
9780841238572 [084123857X]
Language:
English
Call no.:
A05800/874
Type:
Conference Proceedings

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