Large-area definition of nanoelectrodes by nanoimprint lithography
- Author(s):
Wissen, M. ( Univ. of Wuppertal (Germany) ) Scheer, H.-C. Schulz, H. Horstmann, J. T. ( Univ. of Dortmund (Germany) ) Scherff, M. ( Univ. of Hagen (Germany) ) Fahrner, W. R. - Publication title:
- Fifth International Symposium on Instrumentation and Control Technology : 24-27 October 2003, Beijing, China
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5253
- Pub. Year:
- 2003
- Page(from):
- 122
- Page(to):
- 129
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819451378 [0819451371]
- Language:
- English
- Call no.:
- P63600/5253
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Pattern-induced non-uniformity of residual layers in nanoimprint lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
8
Conference Proceedings
Low-temperature wafer-scale warm embossing for mix and match with UV lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Nanoimprint lithography with a commercial 4-in. bond system for hot embossing
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Noncontact fluorescence measurements for inspection and imprint depth control in nanoimprint lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Challenges of residual layer minimisation in thermal nanoimprint lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |