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Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements

Author(s):
Erdmann, T. ( Friedrich-Schiller-Univ. Jena (Germany) )
Cumme, M.
Wittig, L.-Chr.
Kley, E.-B.
Wyrowski, F.
Tuennerman, A.
1 more
Publication title:
Lithographic and micromachining techniques for optical component fabrication II : 3-4 August 2003, San Diego, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5183
Pub. Year:
2003
Page(from):
132
Page(to):
139
Pages:
8
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819450562 [0819450561]
Language:
English
Call no.:
P63600/5183
Type:
Conference Proceedings

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