Selete activity of 157-nm lithography and masks
- Author(s):
- Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Wakamiya, W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Publication title:
- 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5148
- Pub. Year:
- 2003
- Page(from):
- 220
- Page(to):
- 224
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450180 [0819450189]
- Language:
- English
- Call no.:
- P63600/5148
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Investigation of attenuated phase-shifting mask material for 157-nm lithography
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Development and evaluation of an F2 laser for immersion interference lithography at 157 nm
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |