Extending TeraStar reticle inspection capability to the 90nm node through layer-specific algorithms
- Author(s):
- Rudzinski, M.W. ( KLA-Tencor Corp. (USA) )
- Garcia, H.I. ( KLA-Tencor Corp. (USA) )
- Volk, W.W. ( KLA-Tencor Corp. (USA) )
- Wang, L. ( KLA-Tencor Corp. (USA) )
- Publication title:
- 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5148
- Pub. Year:
- 2003
- Page(from):
- 98
- Page(to):
- 106
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819450180 [0819450189]
- Language:
- English
- Call no.:
- P63600/5148
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
New die-to-database inspection algorithm for inspection of 90-nm node reticles
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
High-resolution reticle inspection technique providing a complete reticle qualification solution in advanced 90-nm node wafer fabs
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Energy flux method for die-to-database inspection of critical layer reticles
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Phase defect inspection of 130-nm node phase-shift masks using a simultaneous transmitted and reflected light pattern inspection algorithm
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Correlating reticle pinhole defects to wafer printability for the 90-nm node lithography using advanced RET
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Investigation of smart inspection of critical layer reticles using additional designer data to determine defect significance
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |