Accuracy vs. complexity: OPC solutions and tradeoffs

Accuracy vs. complexity: OPC solutions and tradeoffs

Author(s):

Banachowicz, B. ( Cypress Semiconductor Corp. (USA) )

Iandolo, W. ( Cypress Semiconductor Corp. (USA) )

Balasinski, A.P. ( Cypress Semiconductor Corp. (USA) )

Staud, W. ( Cadence Design Systems (USA) )

Ma, M.W. ( Cadence Design Systems (USA) )

Sweis, J. ( Cadence Design Systems (USA) )

1 more

Publication title:

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5148

Pub. Year:

2003

Page(from):

32

Page(to):

41

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819450180 [0819450189]

Language:

English

Call no.:

P63600/5148

Type:

Conference Proceedings

Details

TDL ID:	ZA00013133
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2003 : 19th
Conf. info. (Venue):	Sonthofen, Germany
Conf. info. (Date):	2003.01.13-2003.01.15

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