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Physical Characterization of Thin HfO2 Layers by the Combined Analysis with Complementary Techniques

Author(s):
Bender, H.
Conard, T.
Richard, O.
Brijs, B.
Petry, J.
Vandervorst, W.
Defranoux, C.
Boher, P.
Rochat, N.
Wyon, C.
Mack, P.
Wolstenholme, J.
Vitchev, R.
Houssiau, L.
Pireaux, J-J.
Bergmaier, A.
Dollinger, G.
12 more
Publication title:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5133
Pub. Year:
2003
Page(from):
223
Page(to):
232
Pages:
10
Pub. info.:
Pennington, NJ: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449993 [0819449997]
Language:
English
Call no.:
P63600/5133
Type:
Conference Proceedings

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