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Pattern inspection of EUV mask using an EUV microscope

Author(s):
Watanabe, T. ( Himeji Institute of Technology (Japan) )
Haga, T. ( NTT Corp. (Japan) )
Shoki, T. ( HOYA Corp. (Japan) )
Hamamoto, K. ( Himeji Institute of Technology (Japan) )
Takada, S. ( CREST, JST (Japan) )
Kazui, N. ( Himeji Institute of Technology (Japan) )
Kakunai, S. ( CREST, JST (Japan) )
Tsubakino, H. ( Himeji Institute of Technology (Japan) )
Kinoshita, H. ( Himeji Institute of Technology (Japan) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
1005
Page(to):
1013
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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