Complementary splitting with stress emulation for stencil masks
- Author(s):
- Nakayama, K. ( Sony Corp. (Japan) )
- Inoue, K. ( Sony Corp. (Japan) )
- Ashida, I. ( Sony Corp. (Japan) )
- Omori, S. ( Sony Corp. (Japan) )
- Ohnuma, H. ( Sony Corp. (Japan) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 979
- Page(to):
- 989
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
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