Blank Cover Image

Development of LEEPL 6025 format mask blanks

Author(s):
  • Aritsuka, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Iimura, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Sano, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
951
Page(to):
957
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Development of a LEEPL mask: flatness and IP measurements

Aritsuka, Y., Kitada, M., Kurosawa, M., Takikawa, T., Fujita, H., Sano, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Unified mask data formats for EB writers

Kuriyama, K., Suzuki, T., Hirumi, J., Yoshioka, N., Hojo, Y., Kawase, Y., Hara, S., Hoga, M., Watanabe, S.W., Inoue, M., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Experimental analysis of image placement accuracy of single-membrane masks for LEEPL [5853-81]

Kitada, M., Aritsuka, Y., Yusa, S., Kuwahara, N., Fujita, H., Takikawa,T., Sano, H., Hoga, M.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Improvement of unified mask data formats for EB writers

Suzuki, T., Hirumi, J., Yoshioka, N., Hojyo, Y., Kawase, Y., Hara, S., Kuriyama, K., Hoga, M., Watanabe, S.W., Kawase, …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings 200-mm EPL stencil mask fabrication and metrology

Fujita, H., Takigawa, T., Ishikawa, M., Aritsuka, Y., Yusa, S., Hoga, M., Sano, H.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Development of a particle-detection system for phase-shifting masks

Shishido,H., Matsumoto,S., Kenbo,Y., Hoga,M., Koizumi,Y.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Impact of deformation of the edges of two complementary patterns on electron-beam projection lithography mask making

Sano, H., Morimoto, K., Aritsuka, Y., Fujita, H.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Image placement accuracy of single-membrane stencil masks for e-beam lithography [5992-162]

Kitada, M., Yusa, S., Kuwahara, N., Fujita, H., Takikawa, T., Sano, H., Hoga, M.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Evaluation of a transmission CD-SEM for EB stencil masks

Ishikawa, M., Fujita, H., Hoga, M., Sano, H.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings 200-mm EPL stencil mask fabrication and metrology at DNP: IP and CD accuracy within subfield

Takikawa, T., Ishikawa, M., Yusa, S., Kinase, Y., Fujita, H., Hoga, M., Hayashi, N., Sano, H.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings CD-measurement technique for hole patterns on stencil mask

Ishikawa, M., Yusa, S., Takikawa, T., Fujita, H., Sano, H., Hoga, M., Hayashi, N.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Modeling LEEPL mask fabrication processes

Azkorra, X., Mikkelson, A.R., Engelstad, R.L., Lovell, E.G., Chang, J., Sohn, J., Nataraju, M., Eguchi, H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12