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Evaluation of a transmission CD-SEM for EB stencil masks

Author(s):
  • Ishikawa, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Fujita, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
  • Sano, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
898
Page(to):
906
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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