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Identifying process window marginalities of reticle designs for 0.15/0.13-μm technologies

Author(s):
Lo, S.C. ( UMC (Taiwan) )
Hsieh, L.K. ( UMC (Taiwan) )
Yeh, J.B. ( UMC (Taiwan) )
Pai, Y.-C. ( UMC (Taiwan) )
Tseng, W. ( UMC (Taiwan) )
Lin, M. ( KLA-Tencor Corp. (USA) )
Peterson, I.B. ( KLA-Tencor Corp. (USA) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
829
Page(to):
837
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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