Investigation of phase variation impact on CPL PSM for low k1 imaging
- Author(s):
Lin, C. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Lin, S.Y. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Shi, X. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Tang, F.C. ( Winbond Electronics Corp. (Taiwan) ) Hsieh, W.A. ( Winbond Electronics Corp. (Taiwan) ) Huang, C.Y. ( Winbond Electronics Corp. (Taiwan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 804
- Page(to):
- 811
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
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