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Unified mask data formats for EB writers

Author(s):
Kuriyama, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Suzuki, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hirumi, J. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hojo, Y. ( Hitachi High-Technologies Corp. (Japan) )
Kawase, Y. ( JEOL Ltd. (Japan) )
Hara, S. ( NuFlare Technology Inc. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Watanabe, S.W. ( Dai Nippon Printing Co., Ltd. (Japan) )
Inoue, M. ( Seiko Instruments Inc. (Japan) )
Kawase, H. ( Seiko Instruments Inc. (Japan) )
Kamimoto, T. ( Seiko Instruments Inc. (Japan) )
7 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
660
Page(to):
671
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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