Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography

Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography

Author(s):

Tateno, M. ( NEC Corp. (Japan) )

Takayama, N. ( NEC Corp. (Japan) )

Murakami, S. ( NEC Corp. (Japan) )

Hatta, K. ( NEC Corp. (Japan) )

Akima, S. ( Toppan Printing Co., Ltd. (Japan) )

Matsuo, F. ( Toppan Printing Co., Ltd. (Japan) )

Otaki, M. ( Toppan Printing Co., Ltd. (Japan) )

Kim, B.-G. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Tanaka, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

5 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

446

Page(to):

453

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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