Blank Cover Image

PSM quartz etch depth evaluation with an atomic force microscope

Author(s):
Noguchi, K. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Yoshida, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Adachi, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Abe, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Kokubo, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
4 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
407
Page(to):
414
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Mask CD measurements with an atomic force microscope

Yoshida, Y., Sasaki, S., Abe, T., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Feasibility study of detectability and printability for TaSiOx

Nishiguchi, M., Morikawa, Y., Motonaga, T., Noguchi, K., Sasaki, S., Mohri, S.H., Hoga, M., Hayashi, N.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y., Kokubo, H., Noguchi, K., Sasaki, S., Mohri, H., Hoga, M., Kanda, N., Irie, S., Watanabe, K., Suganaga, T., …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Development of attenuating PSM shifter for F2 and high-transmission ArF lithography

Nozawa, O., Shiota, Y., Mitsui, H., Suzuki, T., Ohkubo, Y., Ushida, M., Yusa, S., Nishimura, T., Noguchi, K., Sasaki, …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Development of EUV mask fabrication process using Ru capping blank

T. Abe, T. Adachi, S. Sasaki, H. Mohri, N. Hayashi

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Defect inspection and repair performance on CPL masks for 90- and 65-nm node line patterns

Morikawa, Y., Kojima, K., Hashimoto, H., Yoshida, Y., Sasaki, S., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Optimization of Alt-PSM structure for 45nm node ArF immersion lithography [5992-109]

Adachi, T., Mesuda, K., Tiyama, N., Morikawa, Y., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings NIL template making and imprint evaluation [6349-85]

Yoshida, Y., Kobiki, A., Hiraka, T., Yusa, S., Sasaki, S., Itoh, K., Toyama, N., Kurihara, M., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]

Morikawa, Y., Sutou, T., Inazuki, Y., Adachi, T., Yoshida, Y., Kojima, K., Sasaki, S., Mohri, H., Hayashi, N., Dmitriev, …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Optimization of Alt-PSM structure for 100-nm-node ArF lithography: ＩＩ

Mesuda, K., Toyama, N., Narukawa, S., Morikawa, Y., Mohri, H., Hayashi, N., Hoga, M.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Dry etch technology development for NIL template [6283-87]

Yoshida, Y., Amano, T., Sasaki, S., Itoh, K., Toyama, N., Mohri, H., Hayashi, N.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Evaluation of dry etching and defect repair of EUVL mask absorber layer

Abe, T., Amano, T., Motonaga, T., Sasaki, S., Mohri, H., Hayashi, N., Tanaka, Y., Nishiyama, I.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12