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New die-to-database inspection algorithm for inspection of 90-nm node reticles

Author(s):
Garcia, H.I. ( KLA-Tencor Corp. (USA) )
Volk, W.W. ( KLA-Tencor Corp. (USA) )
Watson, S. ( KLA-Tencor Corp. (USA) )
Hess, C. ( KLA-Tencor Corp. (USA) )
Aquino, C. ( KLA-Tencor Corp. (USA) )
Wiley, J. ( KLA-Tencor Corp. (USA) )
Mack, C.A. ( KLA-Tencor Corp. (USA) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
364
Page(to):
374
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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