Inspection of aggressive OPC using aerial image-based mask inspection
- Author(s):
Hsu, L.T.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hung, J.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Hsieh, H.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Rosenbusch, A. ( Etec Systems, Inc., an Applied Materials Co. (USA) ) Falah, R. ( Etec Systems, Inc., an Applied Materials Co. (Israel) ) Blumberg, Y. ( Etec Systems, Inc., an Applied Materials Co. (Israel) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 357
- Page(to):
- 363
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Aerial-image-based off-focus inspection: lithography process window analysis during mask inspection
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Reticle inspection optimization for 90-nm and 130-nm technology nodes using a multibeam UV wavelength inspection tool
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Mask process design optimization based on quality mapping using standard mask inspection equipment
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Defect detection for short-loop process and SRAM-cell optimization by using addressable failure site-test structures(AFS-TS)
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Aerial image-based mask inspection: a development effort to detect what might impact printing image quality on wafers
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |