Proximity effects for rinse, dry, and etch parameters
- Author(s):
- Kim, S.-K. ( Hanyang Univ. (South Korea) )
- Oh, H.-K. ( Hanyang Univ. (South Korea) )
- Kim, H.S. ( Sun Moon Univ. (South Korea) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 281
- Page(to):
- 286
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Development of spin-on carbon hardmasks with comparable etch resistance to Amorphous Carbon Layer (ACL)
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Temperature Effects on the Trapping Behavior of Electrons in X-Ray Irradiated IGFETS
Electrochemical Society |
3
Conference Proceedings
Hybrid PPC methodology and implementation in the correction of etch proximity
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Dry Sliding Wear Characteristics of Ti-Nb-Si Alloys for Biomedical Application
Trans Tech Publications |
10
Conference Proceedings
Dry-etch proximity function for model-based OPC beyond 65-nm node [6155-03]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
12
Conference Proceedings
Practical extracting method of PEB parameters by using rotating compensator spectroscopic ellipsometer
SPIE-The International Society for Optical Engineering |