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Improvement of chrome CDU by optimizing focus ring design

Author(s):
Anderson, R.B. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
Ruhl, G.G. ( Infineon Technologies, AG (Germany) )
Nesladek, P. ( Infineon Technologies, AG (Germany) )
Prechtl, G. ( Infineon Technologies, AG (Germany) )
Sabisch, W. ( Infineon Technologies, AG (Germany) )
Kersch, A. ( Infineon Technologies, AG (Germany) )
Buie, M.J. ( Etec Systems, Inc., an Applied Materials Co. (USA) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
264
Page(to):
274
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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