New development method eliminating the loading and microloading effect

New development method eliminating the loading and microloading effect

Author(s):

Ooishi, K. ( Tokyo Electron Kyushu Ltd. (Japan) )

Esaki, Y. ( Tokyo Electron Kyushu Ltd. (Japan) )

Sakamoto, K. ( Tokyo Electron Kyushu Ltd. (Japan) )

Sakurai, H. ( Toshiba Corp. (Japan) )

Itoh, M. ( Toshiba Corp. (Japan) )

Nakao, M. ( Dai Nippon Printing Co., Ltd. (Japan) )

Nishimura, T. ( Dai Nippon Printing Co., Ltd. (Japan) )

Miyashita, H. ( Dai Nippon Printing Co., Ltd. (Japan) )

Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )

Tanabe, S. ( DT Fine Electronics Co., Ltd. (Japan) )

Oosaki, Y. ( DT Fine Electronics Co., Ltd. (Japan) )

Sasagawa, Y. ( DT Fine Electronics Co., Ltd. (Japan) )

7 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

67

Page(to):

77

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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