Current developments of a high-performance CA resist for mask-making application

Current developments of a high-performance CA resist for mask-making application

Author(s):

Huang, W.-S. ( IBM Microelectronics Div. (USA) )

He, W. ( IBM Microelectronics Div. (USA) )

Li, W. ( IBM Microelectronics Div. (USA) )

Moreau, W.M. ( IBM Microelectronics Div. (USA) )

Lang, R. ( IBM Microelectronics Div. (USA) )

Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) )

Petrillo, K.E. ( IBM Thomas J. Watson Research Ctr. (USA) )

Mahorowala, A.P. ( IBM Thomas J. Watson Research Ctr. (USA) )

Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. (USA) )

Deverich, C. ( IBM Microelectronics Div. (USA) )

Huang, C. ( IBM Microelectronics Div. (USA) )

Rabidoux, P.A. ( IBM Microelectronics Div. (USA) )

7 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

58

Page(to):

66

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings

Details

TDL ID:	ZA00013118
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2003 : 10th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2003.04.16-2003.04.18

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