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Development of attenuating PSM shifter for F2 and high-transmission ArF lithography

Author(s):
Nozawa, O. ( HOYA Corp. (Japan) )
Shiota, Y. ( HOYA Corp. (Japan) )
Mitsui, H. ( HOYA Corp. (Japan) )
Suzuki, T. ( HOYA Corp. (Japan) )
Ohkubo, Y. ( HOYA Corp. (Japan) )
Ushida, M. ( HOYA Corp. (Japan) )
Yusa, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Nishimura, T. ( Dai Nippon Printing Co., Ltd. (Japan) )
Noguchi, K. ( Dai Nippon Printing Co., Ltd. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
7 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology X
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5130
Pub. Year:
2003
Page(from):
39
Page(to):
50
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449962 [0819449962]
Language:
English
Call no.:
P63600/5130
Type:
Conference Proceedings

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