Mask pattern generator employing EPL technology

Author(s):

• Yoshioka, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
• Yamabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
• Wakamiya, W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
• Endo, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Publication title:

Photomask and Next-Generation Lithography Mask Technology X

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5130

Pub. Year:

2003

Page(from):

33

Page(to):

38

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449962 [0819449962]

Language:

English

Call no.:

P63600/5130

Type:

Conference Proceedings