Catalytic plasma chemical etching of silicon and silicon dioxide

Catalytic plasma chemical etching of silicon and silicon dioxide

Author(s):

Dikarev, Y.I. ( Voronezh State Univ. (Russia) )
Surovtsev, I.S. ( Voronezh State Univ. (Russia) )
Tsvetkov, S.M. ( Voronezh State Univ. (Russia) )

Publication title:

Fundamental problems of optoelectronics and microelectronics : 30 September-4 october, 2002, Vladivostok, Russia

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5129

Pub. Year:

2003

Page(from):

288

Page(to):

294

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819449894 [081944989X]

Language:

English

Call no.:

P63600/5129

Type:

Conference Proceedings

Details

TDL ID:	ZA00013117
Series ID:	PA00000029
Conf. info. (Name):	Fundamental problems of optoelectronics and microelectronics
Conf. info. (Number):	2002
Conf. info. (Venue):	Vladivostok, Russia
Conf. info. (Date):	2002.09.30-2002.10.04

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