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Nanometer-scale analysis of current limited stresses impact on SiO2 gate oxide reliability using C-AFM

Author(s):
Publication title:
Nanotechnology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5118
Pub. Year:
2003
Page(from):
466
Page(to):
473
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449788 [0819449784]
Language:
English
Call no.:
P63600/5118
Type:
Conference Proceedings

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