Blank Cover Image

Cost-effective masks for deep x-ray lithography

Author(s):
Scheunemann, H.-U. ( BESSY GmbH (Germany) )
Loechel, B. ( BESSY GmbH (Germany) )
Jian, L. ( BESSY GmbH (Germany) )
Schondelmaier, D. ( BESSY GmbH (Germany) )
Desta, Y.M. ( Louisiana State Univ. (USA) )
Goettert, J. ( Louisiana State Univ. (USA) )
1 more
Publication title:
Smart Sensors, Actuators, and MEMS
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5116
Pub. Year:
2003
Vol.:
2
Pt.:
Poster Session
Page(from):
775
Page(to):
781
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819449764 [0819449768]
Language:
English
Call no.:
P63600/5116
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Fabrication of large-area x-rays masks for UDXRL on beryllium using thin film UV lithography and x-ray backside exposure

Kouba, J., Ling, Z.-G., Wang, L., Desta, Y.M., Goettert, J.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings *Soft X-rays for deep sub-100 nm lithography, with and without masks

Smith, Henry I., Carter, D. J.D., Ferrera, J., Gil, D., Goodberlet, J., Hastings, J. T., Lim, M. H., Meinhold, M., …

MRS-Materials Research Society
2 Conference Proceedings High-resolution x-ray masks for the application of high-aspect-ratio microelectromechanical systems (HARMS)

Wang, L., Desta, Y.M., Goettert, J., Xian, F.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Cost-effective mask fabrication on Kapton membrane for deep x-ray lithography

Stadler,S., Derhalli,I., Malek,C.K.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Multilevel microstructures and mold inserts fabricated with planar and oblique x-ray lithography of SU-8 negative photoresist

Jian,L., Desta,Y.M., Gottert,J.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Cost effective strategies for ASIC masks

Pramanik, D., Kamberian, H.H., Progler, C.J., Sanie, M., Pinto, D.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Fabrication of graphite masks for deep and ultradeep x-ray lithography

Desta,Y.M., Aigeldinger,G., Zanca,K.J., Coane,P.J., Gottert,J., Murphy,M.C.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Preliminary results at the ultradeep x-ray lithography beamline at CAMD

Aigeldinger,G., Coane,P.J., Craft,B.C., Goettert,J., Ledger,S., Ling,Z.G., Manohara,H.M., Rupp,L.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Thermal management of masks for deep x-ray lithography

Khounsary,A.M., Chojnowski,D., Mancini,D.C., Lai,B.P., Dejus,R.J.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Molded multilevel modular microfluidic devices

Aristone, F., Datta, P., Desta, Y.M., Espindola, A.M., Goettert, J.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Stacked ultradeep x-ray lithography exposures: preliminary results

Aigeldinger,G., Desta,Y.M., Gottert,J., Pantenburg,F.-J.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Advances in fabrication of x-ray masks based on vitreous carbon using a new UV sensitive positive resist

A. Voigt, J. Kouba, M. Heinrich, G. Gruetzner, H.-U. Scheunemann

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12