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Effects of stress annealing on the index of refraction of SiO2 layers in MOS devices

Author(s):
Publication title:
Lightmetry 2002: Metrology and Testing Techniques Using Light
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5064
Pub. Year:
2003
Page(from):
281
Page(to):
286
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448705 [0819448702]
Language:
English
Call no.:
P63600/5064
Type:
Conference Proceedings

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