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Advanced process control for poly-Si gate etching using integrated CD metrology

Author(s):
Kota, G.P. ( Lam Research Corp. (USA) )
Luque, J. ( Lam Research Corp. (USA) )
Vahedi, V. ( Lam Research Corp. (USA) )
Khathuria, A. ( Advanced Micro Devices, Inc. (USA) )
Dziura, T.G. ( KLA-Tencor Corp. (USA) )
Levy, A. ( KLA-Tencor Corp. (USA) )
1 more
Publication title:
Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5044
Pub. Year:
2003
Page(from):
90
Page(to):
96
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448491 [0819448494]
Language:
English
Call no.:
P63600/5044
Type:
Conference Proceedings

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