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Multiloop photolithography control using hierarchical context information for APC models

Author(s):
Stuber, J.D. ( Texas Instruments Inc. (USA) )  
Publication title:
Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5044
Pub. Year:
2003
Page(from):
75
Page(to):
82
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448491 [0819448494]
Language:
English
Call no.:
P63600/5044
Type:
Conference Proceedings

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