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Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology

Author(s):
Lee, T.-K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Wang, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chi, M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lu, C.Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Hsieh, C.H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R.G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liao, H.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yang, S.S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chang, C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
4 more
Publication title:
Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5042
Pub. Year:
2003
Page(from):
346
Page(to):
352
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448477 [0819448478]
Language:
English
Call no.:
P63600/5042
Type:
Conference Proceedings

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