Lithography-driven layout of logic cells for 65-nm node
- Author(s):
- Pramanik, D. ( Synopsys, Inc. (USA) )
- Cote, M.L. ( Synopsys, Inc. (USA) )
- Publication title:
- Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5042
- Pub. Year:
- 2003
- Page(from):
- 126
- Page(to):
- 134
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448477 [0819448478]
- Language:
- English
- Call no.:
- P63600/5042
- Type:
- Conference Proceedings
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