Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Author(s):

Fleurov, V.B. ( Cymer, Inc. (USA) )

III, D.J.C. ( Cymer, Inc. (USA) )

Brown, D.J.W. ( Cymer, Inc. (USA) )

O'Keeffe, P. ( Cymer, Inc. (USA) )

Besaucele, H. ( Cymer, Inc. (USA) )

Ershov, A.I. ( Cymer, Inc. (USA) )

Trintchouk, F. ( Cymer, Inc. (USA) )

Ishihara, T. ( Cymer, Inc. (USA) )

Zambon, P. ( Cymer, Inc. (USA) )

Rafac, R.J. ( Cymer, Inc. (USA) )

Lukashev, A. ( Cymer, Inc. (USA) )

6 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Three

Page(from):

1694

Page(to):

1703

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013031
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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