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Evaluating scanner lens spherical aberration using scatterometer

Author(s):
Wang, C. ( Texas Instruments Inc. (USA) )
Zhang, G. ( Texas Instruments Inc. (USA) )
Tan, C.L. ( Texas Instruments Inc. (USA) )
Atkinson, C. ( Texas Instruments Inc. (USA) )
Boehm, M.A. ( Texas Instruments Inc. (USA) )
Brown, J.M. ( Nikon Precision Inc. (USA) )
Godfrey, D. ( Nikon Precision Inc. (USA) )
Littau, M.E. ( Accent Optical Technologies, Inc. (USA) )
Raymond, C.J. ( Accent Optical Technologies, Inc. (USA) )
4 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1456
Page(to):
1464
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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