Evaluating scanner lens spherical aberration using scatterometer
- Author(s):
Wang, C. ( Texas Instruments Inc. (USA) ) Zhang, G. ( Texas Instruments Inc. (USA) ) Tan, C.L. ( Texas Instruments Inc. (USA) ) Atkinson, C. ( Texas Instruments Inc. (USA) ) Boehm, M.A. ( Texas Instruments Inc. (USA) ) Brown, J.M. ( Nikon Precision Inc. (USA) ) Godfrey, D. ( Nikon Precision Inc. (USA) ) Littau, M.E. ( Accent Optical Technologies, Inc. (USA) ) Raymond, C.J. ( Accent Optical Technologies, Inc. (USA) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Three
- Page(from):
- 1456
- Page(to):
- 1464
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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