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Wavefront aberration measurement in 157-nm high numerical aperture lens

Author(s):
Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kanda, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Cashmore, J.S. ( Exitech Ltd. (United Kingdom) )
Gower, M.C. ( Exitech Ltd. (United Kingdom) )
2 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1408
Page(to):
1419
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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