Wavefront aberration measurement in 157-nm high numerical aperture lens
- Author(s):
Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kanda, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Cashmore, J.S. ( Exitech Ltd. (United Kingdom) ) Gower, M.C. ( Exitech Ltd. (United Kingdom) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part Three
- Page(from):
- 1408
- Page(to):
- 1419
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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