Blank Cover Image

Challenges of implementing 193-nm lithography in printing sub-70nm line patterns for thin film heads

Author(s):
  • Wang, C.-M. ( Hitachi Global Storage Technologies (USA) )
  • Hwu, J.J. ( Hitachi Global Storage Technologies (USA) )
  • Minvielle, T.J. ( Hitachi Global Storage Technologies (USA) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1335
Page(to):
1343
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Printing high-density patterns with dark-field 193-nm lithography

Wood Ⅱ,O.R., White,D.L., Tennant,D.M., Cirelli,R.A., Sweeney,J.R., Blakey,M.I., Griffith,J.E.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings 193-nm lithography

Rothschild,M., Forte,A.R., Horn,M.W., Kunz,R.R., Palmateer,S.C., Sedlacek,J.H.C.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Next-generation 193-nm laser for sub-100-nm lithography

Duffey,T.P., Blumenstock,G.M., Fleurov,V.B., Pan,X.J., Newman,P.C., Glatzel,H., Watson,T.A., Erxmeyer,J., …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography

A. J. Merriam, D. S. Bethune, J. A. Hoffnagle, W. D. Hinsberg, C. M. Jefferson, J. J. Jacob, T. Litvin

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography

M. Wang, N. D. Jarnagin, W. Yueh, J. M. Roberts, M. Tapia-Tapia, N. Batina, K. E. Gonsalves

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths

Wang,Y.-Y., Lin,H.-T., Yu,S.-S., Chen,C.-K., Ku,Y.-C., Yen,A., Lin,B.J.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing

Ronse,K., Maenhoudt,M., Marschner,T., Van,den,hove,L., Streefkerk,B., Finders,J., van,Schoot,J., Luehrmann,P.F., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Step and flash imprint lithography for sub-100-nm patterning

Colburn,M., Grot,A., Amistoso,M.N., Choi,B.J., Bailey,T.C., Ekerdt,J.G., Sreenivasan,S.V., Hollenhorst,J., Willson,C.G.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings 25 nm immersion lithography at 193 nm wavelength

Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Feasibility study of printing sub-100-nm with ArF lithography

Kim,S.-K., Hong,J.-G., Park,J.-O., Yoo,T.-J., Hyun,Y.-S., Bok,C.-K., Shin,K.-S.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Resists for sub-100nm patterning at 193 nm exposure [6153-178]

Jarnagin, N. D., Gonsalves, K. E., Wang, M. X., Roberts. J. M., Yeuh, W.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Rinse additives for line-edge roughness control in 193-nm lithography

Goldfarb, D.L., Burns, S.D., Burns, R.L., Brodsky, C.J., Lawson, M.C., Angelopoulos, M.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12