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ArF issues of 90-nm-node DRAM device integration

Author(s):
Goo, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, B.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, J.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, K.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Three
Page(from):
1296
Page(to):
1303
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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