Dipole options for 90-nm lithography technologies and below

Dipole options for 90-nm lithography technologies and below

Author(s):

Chua, G.S. ( National Univ. of Singapore (Singapore) )
Tay, C.J. ( National Univ. of Singapore (Singapore) )
Quan, C. ( National Univ. of Singapore (Singapore) )
Lin, Q. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Chua, L.-H. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Three

Page(from):

1284

Page(to):

1295

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013031
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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