Gate imaging for 0.09-μm logic technology: comparison of single exposure with assist bars and the CODE approach

Gate imaging for 0.09-μm logic technology: comparison of single exposure with assist bars and the CODE approach

Author(s):

Trouiller, Y. ( CEA-LETI (France) )

Belledent, J. ( Philips Semiconductors (France) )

Chapon, J.D. ( STMicroelectronics (France) )

Rousset, V. ( STMicroelectronics (France) )

Rody, Y.F. ( Philips Semiconductors (France) )

Manakli, S. ( STMicroelectronics (France) )

Goirand, P.-J. ( STMicroelectronics (France) )

2 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

1231

Page(to):

1240

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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