Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Author(s):

Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )

Kokubo, H. ( Dai Nippon Printing Co., Ltd. (Japan) )

Noguchi, K. ( Dai Nippon Printing Co., Ltd. (Japan) )

Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )

Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )

Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )

Kanda, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

6 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

1137

Page(to):

1145

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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