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Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography

Author(s):
  • Tan, S.-K. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Lin, Q. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Hsia, L.C. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
  • Sun, S.-C. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
1125
Page(to):
1136
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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