Evaluation of SCAA mask technology as a pathway to the 65-nm node

Evaluation of SCAA mask technology as a pathway to the 65-nm node

Author(s):

Beach, J.V. ( International SEMATECH (USA) )
Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) )
Maslow, M.J. ( Petersen Advanced Lithography, Inc. (USA) )
Gerold, D.J. ( Petersen Advanced Lithography, Inc. (USA) )
McCafferty, D.C. ( ASML (USA) )

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

1103

Page(to):

1114

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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