Guideline of reticle data management

Guideline of reticle data management

Author(s):

Miyazaki, N. ( Fujitsu (Japan) )

Iriki, N. ( Hitachi Ltd. (Japan) )

Homma, M. ( NEC Corp. (Japan) )

Sato, T. ( Toshiba (Japan) )

Mori, M. ( Mitsubishi (Japan) )

Imoriya, T. ( Matsushita Electric Industrial Co., Ltd. (Japan) )

Onodera, T. ( Oki Electric Industry Co., Ltd. (Japan) )

Matsuda, T. ( Sanyo (Japan) )

Higashino, H. ( Oki Electric Industry Co., Ltd. (Japan) )

Okuda, K. ( SEMI (Japan) )

Higashikawa, I. ( Semicondoctor Leading Edge Technologies, Inc. (Japan) )

Yoshioka, N. ( Semicondoctor Leading Edge Technologies, Inc. (Japan) )

7 more

Publication title:

Optical Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5040

Pub. Year:

2003

Vol.:

Part Two

Page(from):

1079

Page(to):

1090

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

Language:

English

Call no.:

P63600/5040

Type:

Conference Proceedings

Details

TDL ID:	ZA00013030
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2003 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2003.02.25-2003.02.28

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