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Effects of soft pellicle frame curvature and mounting process on pellicle-induced distortions in advanced photomasks

Author(s):
Cotte, E.P. ( Univ. of Wisconsin/Madison (USA) )
Engelstad, R.L. ( Univ. of Wisconsin/Madison (USA) )
Lovell, E.G. ( Univ. of Wisconsin/Madison (USA) )
Tanzil, D. ( Intel Corp. (USA) )
Eschbach, F.O. ( Intel Corp. (USA) )
Korobko, Y.O. ( Intel Corp. (USA) )
Fujita, M. ( Mitsui Chemicals, Inc. (Japan) )
Nakagawa, H. ( Mitsui Chemicals, Inc. (Japan) )
3 more
Publication title:
Optical Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5040
Pub. Year:
2003
Vol.:
Part Two
Page(from):
1044
Page(to):
1054
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
Language:
English
Call no.:
P63600/5040
Type:
Conference Proceedings

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